Thin Film Photovoltaic Lab
 
Prof. Udai Pratap Singh
 
School of Electronics Engg
 
email : singhup@kiit.ac.in
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   

Research Area of Interest

Experimental Facility Available

1. Thin film photovoltaic:

            A) Cu(In,Ga)Se2 based solar cells

                        - Deposition technique used are sputtering/selenization and co-evaporation
                        - Deposition of Mo, doped ZnO using DC sputtering
                        - Deposition of CdS using chemical bath deposition
                        - Deposition of ZnO using RF sputtering

            B) CdTe based solar cells

                        - CdTe by non-vacuum process
                        - Deposition using screen-printing/doctor blade technique.
                        - Sintering at high temperature.

2. Microelectronics
            - Metal-Semiconductor interface
            - Hydrogen passivation of defect states I semiconductors

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Three target Sputtering system
RF and DC power supply
Target Size:  2 inch dia.
Available Target: Cu:Ga, In, Mo, ZnO, ZnO:Al, ZnO:B, ZnO:Ga, ITO, Al2O3

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DC Sputtering System
Specifications:
2 Targets
3” dia
Max substrate size deposition 10cm x 10cm
Substrate Temp.  300 oC
Substrate rotation

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Vacuum Coating Unit – Resistive Heating
(for metal deposition)
(VICO, New Delhi)

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Ball Mill, FRITSCH, Germany Pulverisette 6
Particle Size reduction < 1mm ZrO2 jar and ball

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Solar Simulator
Model: SF 150
Make: Scientech, CANADA

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Impedance Analyser
Model: PSM 1700
Make: Newtons4th, UK
Frequency Range:  10mHz to 1 MHz

Source Measure Unit
Model: 2611
Make: Keithley, USA


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E4980A precision LCR meter
AGILENT
FREQUENCY: 20Hz to 2 MHz

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UV-VIS Spectrophotometer
Model: UV-2450 (SHIMADZU,JAPAN)
300-900nm

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RTP Furnace
Suitable for max. 1” x 1” substrates
Max. Temp. 800 oC

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FURNACE Max 800oC

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Hall Measurement System
ECOPIA (KOREA)
MODEL:HMS-3000
Measurement Possible at RT and LN2

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Four Point Probe Method

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RTP Furnace MAX 1000 oC (MTI, USA)
Temp Rise 120 oC/S (for short duration), normal operation 50 oC/S

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FUME HOOD